The process of chemical mechanical polishing is more commonly referred to as just CMP Polishing. This is a process that involves the top surface of a wafer that is polished using a slurry that contains an abrasive grit that is suspended within various reactive chemical agents.
This silicon wafer polishing process is partly chemical and partly mechanical. The mechanical element involved with this process will apply downward pressure and the chemical reaction that occurs will increase the removal rate of material, and this is typically tailored to meet the needs of the material that is being processed.
Chemical Mechanical Polishing Applications
The chemical mechanical polishing systems are considered highly versatile and are designed for being used in various polishing applications where the geometric precision and the service quality are considered extremely important. Modern equipment can be set up and customized by using various wet bench modules, polishing templates, carrier heads, and endpoint detection, which allow you to customize the system to your specific needs.
Specific Areas to Use CMP Systems
There are several ways that CMP systems can be used. These include the silicon wafer CMP, final stage of thinning of SOI and SOS wafers, the reclamation of EPI ready substrates, and many other applications.
Understanding the Process
When it comes to the chemical mechanical polishing solutions available today, there is an array of uses for it. It offers many benefits and understanding what it does and how it is done will help ensure that you use this process as needed for a project. With the right method and system in place, there are several benefits offered by this process. It can also help to minimize mistakes and other issues that may lead to problems with the situation. Understanding all this is going to be beneficial for many reasons and purposes.